We can provide you with customized polyurethane cerium oxide abrasive pad PAD with different specifications and sizes. It can replace LP series polishing pad. It is made of a special microcellular foaming material and designed. It is used to process high flatness requirements and finish requirements. The polyurethane material can make the polishing pad very hard and keep it porous. This hardness can keep the polishing pad flat and consistent for life. It is mainly used for plane processing, thinning and grinding of various substrate materials such as glass precision optical LCD glass disk.
The cerium pad we provide is of stable quality and reasonable cost. The product specifications, dimensions, slotting and gluing can be customized to meet the requirements of the processing technology of the electronic surface industry. Please contact us for more detailed requirements.
